In wafer processing as well as during packaging of the devices, our plasma systems remove unwanted impurities and organic layers such as photoresist after the corresponding process step without damaging the nascent device. This technology guarantees our customers an optimum yield in production.
Our metrology systems are designed to detect defects and surface contamination. They help our customers to see damage and defects on their products and establish the causes at the earliest possible stage. As a result, corresponding measures can be taken quickly in order to prevent damage and further increase productivity.
To our systems
Manufacture of increasingly small components means higher costs for every single manufacturing step. Therefore, it is crucial to detect defects in manufacturing as early as possible. This is the only way in which corresponding corrective measures can be instigated while enabling effective, cost-efficient production.
Current production processes need a high level of cleanliness, as the processes react extremely sensitively to contamination even at the tiniest concentrations. That’s why it is so important to keep all starting materials and process systems as clean as possible. This cleanliness can be proven with VPD technology right up to the boundaries of physical feasibility.