Scanning InfraRed Depolarization SIRD SiC 200 is a modified version of the standard SIRD technology, optimized for measuring silicon carbide substrates and epitaxial layers. Silicon carbide is an…
Our systems to analyse residual stress statesScanning InfraRed Depolarization SIRD SiC 200 is a modified version of the standard SIRD technology, optimized for measuring silicon carbide…
Our SystemsWSMS (Wafer Surface Measurement System) The WSMS system constitutes an enhancement of the WSPS series and combines VPD technology with the outstanding detection limits of the WSPS…
Along the entire production process of the semiconductor industry, i.e. both in the front-end and the back-end, the plasma systems offer a wide range of result- and specification-oriented…
News TechnologiesDates & Fairs Show all notificationsOur MarketsSemiconductor Packaging Separation of the components located on the wafer; packaging into the various types of casings High…
Application Support We have installed the latest versions of our plasma systems in our application laboratories in Wettenberg near Frankfurt am Main and Jena as well as in Corona, California, USA.…
