The plasma systems for the batch process of PVA Metrology & Plasma Solutions all follow the same principle of plasma generation: direct coupling of the highly-frequency stimulation of the atmospheric side in the vacuum chamber. The gas inlet is situated on one side of the chamber and the vacuum suction on the opposite side. This chamber geometry achieves a particularly consistent process outcome.
The modular control system uses a latest-generation processor, a Linux-based platform as the operating system, and a graphical user interface (GUI). Consequently, the processes can be controlled both manually and fully automatically, and the process gases are controlled via MFC. During the process, all parameters are written into a recipe and stored in the database. In parallel with this, the current values for pressure, gas flow, output, etc. are shown on a display that triggers a corresponding alarm in the event of deviations from the target value.